ASML 正把光刻级精度带入混合键合领域。BESI、ASMPT 等厂商源自 pick-and-place 背景,先对准贴装芯片、键合在退火时形成;ASML 从前道工序切入,其光刻设备本就具备亚纳米套刻精度,比前者高出约一个数量级,而混合键合间距越细、单位面积可容纳的信号数越重要。套刻对 ASML 不是难题,真正的挑战是构建将芯片送到晶圆、或将晶圆送到芯片的系统。
AI 生成摘要 · 以原文为准
ASML is bringing lithography-grade precision to hybrid bonding.
“BESI, ASMPT and others come from a pick-and-place background. They’re very good at overlaying each die onto the base wafer and placing it down. The bond itself forms later, during the anneal.”
“ASML is coming at it from the front end. Its tools already do sub-nanometer overlay for lithography, easily an order of magnitude more precise. And as hybrid bond pitches get finer, how many signals you can fit per square millimeter between two dies matters more and more.”
“Overlay isn’t ASML’s problem. The challenge is building a system that brings the dies to the wafer, or in this case, the wafer to the die.”
来源:SemiAnalysis · x.com